Nicolas Paupy, Zakaria Oulad Elhmaidi, Alexandre Chapotot, Tadeáš Hanuš, Javier Arias-Zapata, Bouraoui Ilahi, Alexandre Heintz, Alex Brice Poungoué Mbeunmi, Roxana Arvinte, Mohammad Reza Aziziyan, Valentin Daniel, Gwenaëlle Hamon, Jérémie Chrétien, Firas Zouaghi, Ahmed Ayari, Laurie Mouchel, Jonathan Henriques, Loïc Demoulin, Thierno Mamoudou Diallo, Philippe-Olivier Provost, Hubert Pelletier, Maïté Volatier, Rufi Kurstjens, Jinyoun Cho, Guillaume Courtois, Kristof Dessein, Sébastien Arcand, Christian Dubuc, Abdelatif Jaouad, Nicolas Quaegebeur, Ryan Gosselin, Denis Machon, Richard Arès, Maxime Darnon, Abderraouf Boucherif

Wafer-scale detachable monocrystalline germanium nanomembranes for the growth of III–V materials and substrate reuse

  • General Engineering
  • General Materials Science
  • General Chemistry
  • Atomic and Molecular Physics, and Optics
  • Bioengineering

The Porous germanium Efficient Epitaxial LayEr Release (PEELER) process is introduced allowing the fabrication of wafer scale detachable monocrystalline Ge nanomembranes compatible with III–V material growth on porous Ge and substrate reuse.

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